The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2023
Filed:
Oct. 06, 2020
Canon Kabushiki Kaisha, Tokyo, JP;
Satoshi Iino, Kuki, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An imprint apparatus which is advantageous in improving the accuracy of alignment of a mold and a substrate without reducing productivity is provided. An imprint apparatus that forms a pattern in an imprint material positioned on a substrate by bringing the imprint material and a mold into contact with each other includes a measurement unit which measures a partial surface shape of a predetermined partial shot region of the substrate, a control unit which acquires a correction amount for relative positional deviations of the substrate and the mold which occur while the imprint material and the mold are brought into contact with each other, on the basis of the partial surface shape of the predetermined partial shot region which is measured by the measurement unit, and a shape correction unit which corrects a shape of at least one of the substrate and the mold on the basis of the correction amount, and the control unit acquires the correction amount for the other shot regions of the substrate on the basis of the partial surface shape of the predetermined partial shot region which is measured by the measurement unit.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile