The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2023
Filed:
Oct. 29, 2018
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Rin Jang, Daejeon, KR;
Mi Kyoung Jin, Daejeon, KR;
Moon Ja Nam, Daejeon, KR;
Byoung Hyoun Kim, Daejeon, KR;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 30/88 (2006.01); G01N 30/68 (2006.01); G01N 27/624 (2021.01); G01N 30/72 (2006.01);
U.S. Cl.
CPC ...
G01N 30/68 (2013.01); G01N 27/624 (2013.01); G01N 30/7206 (2013.01); G01N 30/88 (2013.01);
Abstract
A high throughput gas-chromatography system for analysis of high-molecular weight additives in a polymer material, and an analysis method using same are provided. A high throughput gas-chromatography system is capable of qualitatively and quantitatively analyzing, at the same time, high-molecular weight additives in a polymer, and reducing analysis time by increasing a heating rate and a column maximum temperature.
Jang, Rin. (2023). High throughput gas-chromatography system for additive analysis, and analysis method using same (U.S. Patent No. 11835498). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11835498
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