The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2023
Filed:
Nov. 18, 2021
GM Global Technology Operations Llc, Detroit, MI (US);
Shanghai Jiao Tong University, Shanghai, CN;
GM GLOBAL TECHNOLOGY OPERATIONS LLC, Detroit, MI (US);
Abstract
A method of eliminating microstructure inheritance of hypereutectic aluminum-silicon alloys. The method includes heating a first amount of the Al—Si alloy to a predetermined temperature above a liquidus temperature of the Al—Si alloy to form a first amount melt; holding the first amount melt at the predetermined temperature for a predetermined amount of time; stirring the first amount melt during the predetermined amount of time; heating a second amount of the Al—Si alloy above the liquidus temperature of the Al—Si alloy to form a second amount melt; and mixing the first amount melt and the second amount melt to form a processed Al—Si casting alloy. The predetermined temperature is between about 750° C. to 850° C. The predetermined amount of time is between 0.1 hour to 0.5 hour. The processed Al—Si casting alloy contains about 30 wt % to about 40 wt % of the first amount of the Al—Si alloy.