The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2023
Filed:
Mar. 04, 2020
Canon Kabushiki Kaisha, Tokyo, JP;
Yoshihiro Koura, Utsunomiya, JP;
Kunihiko Asada, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
A method of controlling an imprint process to form a pattern by using a mold on a substrate is provided. The method includes inspecting to determine whether to continue or stop a series of imprint processes during the series of imprint processes of a lot, wherein the inspecting includes capturing an image of the pattern formed on a shot region by the imprint process, obtaining, by comparing a position of a peripheral portion of the pattern in the image and a design value of the position of the peripheral portion, an extrusion amount of an imprint material from the shot region due to the imprint process, and determining, based on a change in the extrusion amount over a plurality of imprint processes, a next process to transition from a current process upon stopping the series of imprint processes.