The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2023
Filed:
Mar. 09, 2020
Nexus Spine, Llc, Salt Lake City, UT (US);
Peter Halverson, Draper, UT (US);
David T. Hawkes, Pleasant Grove, UT (US);
Nexus Spine, LLC, Salt Lake City, UT (US);
Abstract
A porous implant design method includes defining a design volume for a porous implant, a load to be borne by the design volume, and an objective function solution characteristic related to the design volume. Next, the load is divided into a plurality of sub-loads and an optimization procedure is performed: until all sub-loads have been applied, one of the plurality of sub-loads is applied to the material in the design volume, material from the design volume is removed such that remaining material within the design volume is capable of bearing one of the plurality of sub-loads while satisfying the objection function solution characteristic; the remaining material defines a void space without material, the void space is set as a new design volume for any remaining sub-loads, the new design volume is set as being full of material. Then, the remaining material from each cycle of the optimization is combined.