The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2023

Filed:

Oct. 26, 2022
Applicant:

W&wsens Devices, Inc., Los Altos, CA (US);

Inventors:

Shih-Yuan Wang, Palo Alto, CA (US);

Shih-Ping Wang, Los Altos, CA (US);

Assignee:

W&WSens Devices Inc., Los Altos, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0236 (2006.01); H01L 27/144 (2006.01); G02B 1/00 (2006.01); G02B 6/42 (2006.01); H01L 27/146 (2006.01); H01L 31/02 (2006.01); H01L 31/0232 (2014.01); H01L 31/028 (2006.01); H01L 31/0352 (2006.01); H01L 31/036 (2006.01); H01L 31/075 (2012.01); H01L 31/077 (2012.01); H01L 31/09 (2006.01); H01L 31/103 (2006.01); H01L 31/105 (2006.01); H01L 31/107 (2006.01); H01L 31/18 (2006.01); H04B 10/25 (2013.01); H04B 10/40 (2013.01); H04B 10/69 (2013.01); H04B 10/80 (2013.01);
U.S. Cl.
CPC ...
H01L 31/02363 (2013.01); G02B 1/002 (2013.01); G02B 6/4204 (2013.01); G02B 6/428 (2013.01); H01L 27/1443 (2013.01); H01L 27/1446 (2013.01); H01L 27/14625 (2013.01); H01L 31/02 (2013.01); H01L 31/028 (2013.01); H01L 31/02016 (2013.01); H01L 31/0232 (2013.01); H01L 31/0236 (2013.01); H01L 31/02325 (2013.01); H01L 31/02327 (2013.01); H01L 31/02366 (2013.01); H01L 31/036 (2013.01); H01L 31/0352 (2013.01); H01L 31/035218 (2013.01); H01L 31/035281 (2013.01); H01L 31/075 (2013.01); H01L 31/077 (2013.01); H01L 31/09 (2013.01); H01L 31/103 (2013.01); H01L 31/105 (2013.01); H01L 31/107 (2013.01); H01L 31/1075 (2013.01); H01L 31/1804 (2013.01); H01L 31/1808 (2013.01); H04B 10/25 (2013.01); H04B 10/40 (2013.01); H04B 10/691 (2013.01); H04B 10/6971 (2013.01); H04B 10/801 (2013.01); G02B 1/005 (2013.01); Y02E 10/547 (2013.01); Y02P 70/50 (2015.11);
Abstract

Microstructures of micro and/or nano holes on one or more surfaces enhance photodetector optical sensitivity. Arrangements such as a CMOS Image Sensor (CIS) as an imaging LIDAR using a high speed photodetector array wafer of Si, Ge, a Ge alloy on SI and/or Si on Ge on Si, and a wafer of CMOS Logic Processor (CLP) ib Si fi signal amplification, processing and/or transmission can be stacked for electrical interaction. The wafers can be fabricated separately and then stacked or can be regions of the same monolithic chip. The image can be a time-of-flight image. Bayer arrays can be enhanced with microstructure holes. Pixels can be photodiodes, avalanche photodiodes, single photon avalanche photodiodes and phototransistors on the same array and can be Ge or Si pixels. The array can be of high speed photodetectors with data rates of 56 Gigabits per second, Gbps, or more per photodetector.


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