The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2023
Filed:
Sep. 25, 2015
Applicant:
Jx Nippon Mining & Metals Corporation, Tokyo, JP;
Inventors:
Kunihiro Oda, Ibaraki, JP;
Takayuki Asano, Ibaraki, JP;
Assignee:
JX Metals Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C22C 19/07 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3426 (2013.01); C22C 19/07 (2013.01); C23C 14/3414 (2013.01);
Abstract
A Co sputtering target having a purity of 99.99% to 99.999% and a Si content of 1 wtppm or less. Provided is a Co sputtering target capable of improving barrier properties and adhesiveness by suppressing conversion into highly reactive silicide by a reduction in the Si content in cobalt.