The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2023

Filed:

Dec. 24, 2020
Applicant:

National Cheng Kung University, Tainan, TW;

Inventors:

Fan-Tien Cheng, Tainan, TW;

Yu-Ming Hsieh, Kaohsiung, TW;

Jing-Wen Lu, Tainan, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G05B 19/418 (2006.01); G06F 18/22 (2023.01); G06F 18/243 (2023.01); G06F 18/214 (2023.01); G06F 18/2413 (2023.01);
U.S. Cl.
CPC ...
G05B 19/41875 (2013.01); G06F 18/214 (2023.01); G06F 18/22 (2023.01); G06F 18/2413 (2023.01); G06F 18/24323 (2023.01); G05B 2219/32194 (2013.01); G05B 2219/45031 (2013.01);
Abstract

Embodiments of the present disclosure provide a method for predicting an occurrence of a tool processing event, thereby determining whether to activate a virtual metrology. In a model-building stage, plural sets of model-building data are used to create at least one classification model in accordance with at least one classification algorithm, in which each classification model includes plural decision trees. Then, probabilities of the decision trees are used to create at least one reliance index model, and the sets of model-building data are used to create at least one similarity index model in accordance with a statistical distance algorithm. In a conjecture stage, a set of processing data of a workpiece is inputted into each classification model, each reliance index model and each similarity index model to determine whether to activate (start) virtual metrology.


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