The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2023

Filed:

Mar. 31, 2021
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Dohyung Kim, Hwaseong-si, KR;

Seongchul Hong, Suwon-si, KR;

Kyungsik Kang, Bucheon-si, KR;

Kyungbin Park, Seoul, KR;

Motoshi Sakai, Suwon-si, KR;

Seungkoo Lee, Seoul, KR;

Jungchul Lee, Hwaseong-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 27/10 (2006.01); H05G 2/00 (2006.01); G02B 27/14 (2006.01); H01S 3/00 (2006.01); H01S 3/23 (2006.01); G03F 7/00 (2006.01); H01S 3/223 (2006.01);
U.S. Cl.
CPC ...
G02B 27/1073 (2013.01); G02B 27/106 (2013.01); G02B 27/108 (2013.01); G02B 27/141 (2013.01); G03F 7/70191 (2013.01); H01S 3/0071 (2013.01); H01S 3/2308 (2013.01); H01S 3/2383 (2013.01); H05G 2/008 (2013.01); H01S 3/2232 (2013.01);
Abstract

A light source capable of operating third and fourth reflection mirrors included in a beam splitting device in conjunction with movements of first and second reflection mirrors included in a beam transfer device and an optical assembly, respectively. The third and fourth reflection mirrors are disposed on optical paths of a pre-pulse and a main pulse emitted from first and second pulse generators, respectively. The light source operates the third and fourth reflection mirrors to offset an excessive compensation of the main pulse caused in a process of compensating for an optical path error of the pre-pulse. The light source may be included in an extreme ultraviolet light source system.


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