The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 2023

Filed:

Jul. 13, 2022
Applicant:

Scopio Labs Ltd., Tel Aviv, IL;

Inventors:

Ittai Madar, Tel Aviv, IL;

Eran Small, Yahud, IL;

Itai Hayut, Tel Aviv, IL;

Erez Na'Aman, Tel Aviv, IL;

Assignee:

SCOPIO LABS LTD., Tel Aviv, IL;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/36 (2006.01); G02B 21/00 (2006.01); G02B 21/12 (2006.01);
U.S. Cl.
CPC ...
G02B 21/367 (2013.01); G02B 21/0084 (2013.01); G02B 21/125 (2013.01);
Abstract

A microscope including an illumination assembly, an image capture device and a processor can be configured to selectively identify regions of a sample including artifacts or empty space. By selectively identifying regions of the sample that have artifacts or empty space, the amount of time to generate an image of the sample and resources used to generate the image can be decreased substantially while providing high resolution for appropriate regions of the computational image. The processor can be configured to change the imaging process in response to regions of the sample that includes artifacts or empty space. The imaging process may include a higher resolution process to output higher resolution portions of the computational image for sample regions including valid sample material, and a lower resolution process to output lower resolution portions of the computational image for sample regions including valid sample material.


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