The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2023
Filed:
Apr. 22, 2021
Flat-knitted three-dimensional fabric with internal support structure, and method for preparing same
Jiangnan University, Jiangsu, CN;
Gaoming Jiang, Jiangsu, CN;
Zhe Gao, Jiangsu, CN;
Honglian Cong, Jiangsu, CN;
Guangjun Wu, Jiangsu, CN;
Jiangtao Tan, Jiangsu, CN;
Mengmeng Zhou, Jiangsu, CN;
JIANGNAN UNIVERSITY, Jiangsu, CN;
Abstract
A flat-knitted three-dimensional fabric with an internal support structure, and the fabric is consisted of an upper surface layer, a lower surface layer, and a support structure yarn in a middle, wherein the upper surface layer and the lower surface layer comprise alternate-knitted single-sided stitches and fully-knitted single-sided stitches; the upper surface layer and the lower surface layer are connected by means of tuck knitting of the support structure yarn in the middle to form the integrally formed three-dimensional fabric with an internal support structure; and the alternate-knitted single-sided stitches are correspond to tuck loops formed by the support structure yarn and are used to lock the tuck loops formed by the support structure yarn in the middle, such that the support structure yarn will not puncture the surfaces of the fabric when the fabric is pressed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile