The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 2023

Filed:

Aug. 09, 2021
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Seul Lee, Hwaseong-si, KR;

Minho Moon, Seongnam-si, KR;

Youngmin Moon, Yongin-si, KR;

Ji-Hee Son, Hwaseong-si, KR;

Seungyong Song, Suwon-si, KR;

Sungsoon Im, Suwon-si, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10K 71/00 (2023.01); G03F 7/00 (2006.01); C23C 16/04 (2006.01); C23C 14/04 (2006.01); H10K 59/12 (2023.01);
U.S. Cl.
CPC ...
H10K 71/00 (2023.02); C23C 14/042 (2013.01); C23C 16/042 (2013.01); G03F 7/0015 (2013.01); H10K 59/12 (2023.02);
Abstract

A method of providing a mask includes providing a first mask layer facing a second mask layer, in the second mask layer, providing a first opening which corresponds to a deposition opening of the mask, providing an auxiliary layer which faces the first mask layer with the second mask layer therebetween and covers the first opening, in the auxiliary layer, providing a second opening which corresponds to the first opening and exposes the first mask layer to outside the auxiliary layer, in the first mask layer, providing a third opening which corresponds to the first opening and the second opening by using the auxiliary layer as a mask and providing the auxiliary layer separated from the first mask layer and the second mask layer to provide the deposition mask having the first mask layer having the third opening and the second mask layer having the first opening.


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