The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2023
Filed:
Sep. 21, 2021
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Kwok Feng Wong, Manteca, CA (US);
Rakesh Ramadas, San Jose, CA (US);
Ashutosh Agarwal, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/68 (2006.01); G01B 11/24 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/681 (2013.01); G01B 11/24 (2013.01); H01L 21/68735 (2013.01);
Abstract
Methods for aligning a processing chamber using a centering ring and processing chambers having the centering ring are describes. The method includes determining an average central position for the centering ring based on the concentricity of the centering with the support surfaces and adjusting average position of centering ring to a final position based on the average central position.