The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2023
Filed:
Nov. 23, 2021
Samsung Sds Co., Ltd., Seoul, KR;
SAMSUNG SDS CO., LTD., Seoul, KR;
Abstract
Provided is a method of managing a target process. The method performed by a process management apparatus includes: generating a reference pattern indicating a normal state based on reference observed data on a process factor measured while the target process is maintained in the normal state; obtaining observed data on the process factor measured for a specified observation period; calculating a dissimilarity between the reference pattern and the observed data; and constructing a regression tree for the target process by using the observed data and the dissimilarity, wherein the process factor is set as an independent variable of the regression tree, and the dissimilarity is set as a dependent variable of the regression tree.