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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11823923 B1

PDFFull Text
Date of Patent:
Nov. 21, 2023

Filed:

Jul. 08, 2022

Transfer chamber

Applicant:

Sinfonia Technology Co., Ltd., Tokyo, JP;

Inventors:

Toshihiro Kawai, Tokyo, JP;

Takashi Shigeta, Tokyo, JP;

Munekazu Komiya, Tokyo, JP;

Yasushi Taniyama, Tokyo, JP;

Assignee:

SINFONIA TECHNOLOGY CO., LTD., Tokyo, JP;

Attorney:

WHDA, LLP

Primary Examiner:

Ronald P Jarrett

Int. Cl.
CPC ...
H01L 21/67 (2006.01); F24F 13/28 (2006.01); F24F 7/06 (2006.01); B01D 53/04 (2006.01); B65G 49/07 (2006.01); H01L 21/677 (2006.01); F24F 3/167 (2021.01); F24F 7/08 (2006.01); H01L 21/673 (2006.01); F24F 7/003 (2021.01); B01D 53/40 (2006.01); B01D 53/42 (2006.01); C12M 1/12 (2006.01); F24F 6/00 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67196 (2013.01); B01D 53/04 (2013.01); B01D 53/40 (2013.01); B01D 53/42 (2013.01); B65G 49/07 (2013.01); C12M 37/00 (2013.01); F24F 3/167 (2021.01); F24F 6/00 (2013.01); F24F 7/003 (2021.01); F24F 7/06 (2013.01); F24F 7/065 (2013.01); F24F 7/08 (2013.01); F24F 13/28 (2013.01); H01L 21/67017 (2013.01); H01L 21/67389 (2013.01); H01L 21/67393 (2013.01); H01L 21/67766 (2013.01); H01L 21/68707 (2013.01); B01D 2258/02 (2013.01);
Abstract

To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device () by using a transfer robot () provided thereinside, and includes a circulation path (CL) formed inside of a transfer chamber () to circulate gas, a chemical filter unit () provided in the midstream of the circulation path (CL), and a connecting and disconnecting means () which switches connection and disconnection of the chemical filter unit () to and from the circulation path (CL).

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