The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2023
Filed:
Oct. 09, 2020
SK Hynix Inc., Gyeonggi-do, KR;
SK hynix Inc., Gyeonggi-do, KR;
Abstract
The technology relates to a semiconductor device including a hard mask easy to strip and capable of implementing a fine pattern with a high etch selectivity. According to an embodiment of the disclosure, a method for fabricating a semiconductor device comprises forming an etching target layer, forming a hard mask layer on the etching target layer, the hard mask layer including a first boron-doped silicon layer and a second boron-doped silicon layer on the first boron-doped silicon layer, and etching the etching target layer using the hard mask layer as an etching barrier, wherein the second boron-doped silicon layer has a larger boron concentration than the first boron-doped silicon layer.