The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2023
Filed:
Feb. 26, 2021
Chunjoo Park, St. Louis, MO (US);
Bin Cai, St. Louis, MO (US);
Sasa Mutic, St. Louis, MO (US);
Washington University, St. Louis, MO (US);
Abstract
A computer-implemented method for correcting artifacts within CT images of a subject includes providing iteratively correcting a CT volumetric image with a high-contrast mask by overpainting the high-contrast mask within CT volumetric image set by evaluating a model function and updating the CT projections to reflect the overpainting using a gradient descent based on previous overpainted CT projections, back-projecting the corrected CT projections to produce a corrected volumetric image set, and comparing the corrected CT volumetric image set against a previous corrected CT volumetric image set until convergence. The original voxels overpainted by the high-contrast mask are re-inserted into the converged CT volumetric image to produce the final CT volumetric image set.