The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 2023

Filed:

Feb. 18, 2021
Applicant:

Raytheon Company, Waltham, MA (US);

Inventor:

Richard Joseph Ready, Flower Mound, TX (US);

Assignee:

Raytheon Company, Waltham, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 7/182 (2021.01); F16M 11/12 (2006.01); F16M 11/20 (2006.01);
U.S. Cl.
CPC ...
G02B 7/1827 (2013.01); F16M 11/123 (2013.01); F16M 11/205 (2013.01);
Abstract

A method includes fabricating a mirror system that includes a dual axis gimbal, a mirror, and a mirror substrate that are formed together as an integral component using an additive manufacturing process. The method also includes forming multiple first gaps in the mirror system using a subtractive manufacturing process, where the first gaps extend through the mirror system in a first direction. The method further includes forming multiple second gaps in the mirror system using the subtractive manufacturing process, where the second gaps extend through the mirror system in a second direction perpendicular to the first direction. The first gaps and the second gaps separate the gimbal into a top portion and a bottom portion.


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