The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 2023

Filed:

Oct. 27, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Xiaoquan Min, Cupertino, CA (US);

Byung Ik Song, Yongin-si, KR;

Hyung Je Woo, Morgan Hill, CA (US);

Venkata Sharat Chandra Parimi, Sunnyvale, CA (US);

Prashant Kumar Kulshreshtha, San Jose, CA (US);

Kwangduk Lee, Redwood City, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4404 (2013.01); C23C 16/4405 (2013.01); H01J 37/32477 (2013.01); H01J 37/32862 (2013.01);
Abstract

Exemplary methods of semiconductor processing may include forming a silicon oxide material on exposed surfaces of a processing region of a semiconductor processing chamber. The methods may include forming a silicon nitride material overlying the silicon oxide material. The methods may include performing a deposition process on a semiconductor substrate disposed within the processing region of the semiconductor processing chamber. The methods may include performing a chamber cleaning process.


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