The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2023
Filed:
Nov. 14, 2018
Institute of Metal Research Chinese Academy of Sciences, Shenyang, CN;
Abstract
An efficient method for preparing a highly-directional highly-dense two-dimensional material film. The method comprises: using a circular tube with a smooth inner surface as a casting mold; and pouring a solution containing a two-dimensional material into the mold when the mold rotates at high speed in a circumferential direction, wherein the solution is uniformly coated on the inner surface of the mold by centrifugal force, the centrifugal rotation generating a shearing force that causes the two-dimensional material to be directionally and regularly arranged layer upon layer in a circumferential direction in the solution, and, the centrifugal force facilitates highly-dense accumulation of the two-dimensional material, thereby obtaining a highly-directional highly-dense two-dimensional material film. The method is applicable in the preparation of a variety of two-dimensional materials such as graphene, a composite material film thereof, and a laminated heterostructure film, and greatly improves electrical, thermal, and mechanical properties of a film.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile