The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 2023

Filed:

Mar. 02, 2020
Applicant:

Inventage Lab, Inc., Seongnam-si, KR;

Inventor:

Ju Hee Kim, Seongnam-si, KR;

Assignee:

INVENTAGE LAB, INC., Seongnam-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 13/06 (2006.01); A61K 9/00 (2006.01); B01L 3/00 (2006.01); B01J 19/00 (2006.01); A61K 9/16 (2006.01); B01F 33/302 (2022.01); B01F 33/30 (2022.01); B01F 33/3011 (2022.01); A61K 9/14 (2006.01); A61K 31/365 (2006.01); A61K 31/58 (2006.01); C08J 5/00 (2006.01); B01J 2/06 (2006.01); B01J 2/02 (2006.01);
U.S. Cl.
CPC ...
B01J 13/06 (2013.01); A61K 9/0019 (2013.01); A61K 9/146 (2013.01); A61K 9/1647 (2013.01); A61K 9/1682 (2013.01); A61K 31/365 (2013.01); A61K 31/58 (2013.01); B01F 33/30 (2022.01); B01F 33/302 (2022.01); B01F 33/3011 (2022.01); B01J 19/0093 (2013.01); B01L 3/502707 (2013.01); C08J 5/00 (2013.01); B01J 2/02 (2013.01); B01J 2/06 (2013.01); B01J 2219/00889 (2013.01); B01L 2200/0647 (2013.01); B01L 2300/0816 (2013.01); B01L 2300/161 (2013.01); C08J 2367/04 (2013.01);
Abstract

Provided is an apparatus for a mass production of microspheres and a multichannel forming device incorporatable therein. The apparatus includes a multi-channel microsphere forming unit, a first source material reservoir containing the first source material and in fluid communication with the plurality of first microchannels, a second source material reservoir containing the second source material and in fluid communication with the plurality of second microchannels, a flow control unit configured to supply a first gas to the first source material reservoir at a first source material flow rate and to supply a second gas to a second source material reservoir at a second source material flow rate and a product reservoir for accommodating the microspheres formed from the multi-channel forming unit.


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