The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2023

Filed:

Apr. 04, 2022
Applicant:

Lg Display Co., Ltd., Seoul, KR;

Inventors:

Joonsuk Lee, Paju-si, KR;

SeJune Kim, Paju-si, KR;

Dohyung Kim, Paju-si, KR;

Saemleenuri Lee, Paju-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10K 77/10 (2023.01); H10K 50/844 (2023.01); H10K 50/86 (2023.01); H10K 59/124 (2023.01); H10K 59/38 (2023.01); H10K 71/00 (2023.01); H10K 71/20 (2023.01); H10K 59/12 (2023.01); H10K 102/00 (2023.01); H10K 59/122 (2023.01); H10K 59/35 (2023.01); G09F 9/30 (2006.01); H10K 59/121 (2023.01); H10K 59/00 (2023.01); H10K 50/84 (2023.01);
U.S. Cl.
CPC ...
H10K 77/111 (2023.02); H10K 50/844 (2023.02); H10K 50/865 (2023.02); H10K 59/124 (2023.02); H10K 59/38 (2023.02); H10K 71/00 (2023.02); H10K 71/233 (2023.02); H10K 59/1201 (2023.02); H10K 2102/311 (2023.02);
Abstract

A method of manufacturing a transparent organic light emitting display apparatus having an emission area, and a transmission area disposed adjacent to the emission area and configured to pass external light therethrough, includes sequentially forming an interlayer dielectric and a first protection layer on a first substrate, patterning a planarization layer over the first protection layer, forming an organic light emitting device over the planarization layer, forming an encapsulation layer and an encapsulation substrate over the organic light emitting device, and exposing and etching at least some portions of the transmission area by using photolithography after the patterning of the planarization layer.


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