The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2023

Filed:

Mar. 27, 2020
Applicant:

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Chao Luo, Beijing, CN;

Feng Guan, Beijing, CN;

Zhi Wang, Beijing, CN;

Jianhua Du, Beijing, CN;

Yang Lv, Beijing, CN;

Zhaohui Qiang, Beijing, CN;

Chao Li, Beijing, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 29/66 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1237 (2013.01); H01L 27/1222 (2013.01); H01L 27/1285 (2013.01); H01L 29/66477 (2013.01); H01L 29/66765 (2013.01); H01L 29/78669 (2013.01); H01L 29/78678 (2013.01);
Abstract

A thin film transistor includes a gate, a gate insulating layer, an active layer, an ionized amorphous silicon layer, a source and a drain. The gate insulating layer covers the gate. The active layer is disposed on a side of the gate insulating layer away from the gate. The ionized amorphous silicon layer is disposed on a side of the active layer away from the gate, and the ionized amorphous silicon layer is in contact with the gate insulating layer. The source and the drain are disposed on a side of the ionized amorphous silicon layer away from the gate insulating layer, and the source and the drain are coupled to the active layer through the ionized amorphous silicon layer.


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