The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2023

Filed:

Oct. 22, 2021
Applicant:

Nanya Technology Corporation, New Taipei, TW;

Inventor:

Chih-Wei Huang, Taoyuan, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/525 (2006.01); H10B 20/20 (2023.01);
U.S. Cl.
CPC ...
H01L 23/5256 (2013.01); H10B 20/20 (2023.02);
Abstract

The present disclosure relates to a method for preparing an electrical fuse (e-fuse) device. The method includes forming a mask layer over a semiconductor substrate, and etching the semiconductor substrate by using the mask layer as a mask to form a fuse link over a semiconductor base. The method also includes epitaxially growing a first bottom anode/cathode region and a second bottom anode/cathode region over the semiconductor base and adjacent to a bottom portion of the fuse link. The fuse link is between the first bottom anode/cathode region and the second anode/cathode region. The method further includes epitaxially growing a top anode/cathode region to replace the mask layer.


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