The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2023
Filed:
Feb. 26, 2021
Samsung Electronics Co., Ltd., Suwon-si, KR;
Sreejith Kallummil, Bangalore, IN;
Sujit Jos, Bangalore, IN;
Ibrahim A, Bangalore, IN;
Ka Ram Choi, Suwon-si, KR;
Sang Kyu Kim, Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A method of transforming Monte Carlo (MC) simulations for diffuse reflectance spectroscopy (DRS) may include obtaining, by a DRS device, MC simulated DRS measurements using a pre-defined number of photons; pre-processing, by the DRS device, the MC simulated DRS measurements to obtain normalized DRS measurements; correcting, by the DRS device, non-monotonicity of the normalized DRS measurements to obtain monotonic DRS measurements; converting, by the DRS device, the monotonic DRS measurements to a logarithmic domain to obtain logarithmic DRS measurements; performing, by the DRS device, curve fitting on the logarithmic DRS measurements in the logarithmic domain to obtain curve-fitted logarithmic DRS measurements; and transforming, by the DRS device, the curve-fitted logarithmic DRS measurements to a non-logarithmic domain to obtain transformed MC simulated DRS measurements.