The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2023
Filed:
Feb. 11, 2021
Applicant:
Seiren Co., Ltd., Fukui, JP;
Inventor:
Kazunori Kawamura, Fukui, JP;
Assignee:
SEIREN CO., LTD., Fukui, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D06N 3/00 (2006.01); D06N 3/14 (2006.01); D04B 21/02 (2006.01); D04B 21/06 (2006.01);
U.S. Cl.
CPC ...
D06N 3/0009 (2013.01); D04B 21/02 (2013.01); D04B 21/06 (2013.01); D06N 3/004 (2013.01); D06N 3/0036 (2013.01); D06N 3/14 (2013.01); D06N 2211/28 (2013.01);
Abstract
Provided is a synthetic leather in which the occurrence of ease wrinkles can be inhibited or reduced. This synthetic leather comprises a cloth (), and a resin layer () laminated on the cloth (). The cloth () is a tricot knitted fabric knitted with front yarn, middle yarn, and back yarn, and having a nap (). The tricot knitted fabric has a cord stitch structure knitted with the front yarn, a denbigh stitch structure or cord stitch structure knitted with the middle yarn, and an inlay structure or cord stitch structure knitted with the back yarn. The nap () is formed by napping a sinker loop side of the tricot knitted fabric.