The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 14, 2023

Filed:

Feb. 08, 2019
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

Sheng Xu, ShangHai, CN;

Yanfei Gu, ShangHai, CN;

Dalong Zhong, ShangHai, CN;

Assignee:

General Electric Company, Schenectady, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 13/12 (2006.01); C23C 4/02 (2006.01); F01D 5/28 (2006.01); C25D 13/00 (2006.01); C23C 28/00 (2006.01);
U.S. Cl.
CPC ...
C25D 13/12 (2013.01); C23C 4/02 (2013.01); C23C 28/3215 (2013.01); C25D 13/00 (2013.01); F01D 5/288 (2013.01); F05D 2230/90 (2013.01);
Abstract

The present invention relates to a method of processing a component, wherein the component comprises at least one opening in a surface thereof, the method comprising: placing the component in an electrophoretic fluid comprising particles of a masking material as an electrode, applying a voltage to the component and a counter electrode of the component, depositing particles of the masking material in the electrophoretic fluid into the at least one aperture through electrophoresis to mask the at least one aperture; processing a surface of the component; and removing the masking material in the at least one opening.


Find Patent Forward Citations

Loading…