logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11814719 B1

PDFFull Text
Date of Patent:
Nov. 14, 2023

Filed:

Mar. 18, 2022

Method of manufacturing deposition mask, intermediate product to which deposition mask is allocated, and deposition mask

Applicant:

Dai Nippon Printing Co., Ltd., Tokyo, JP;

Inventors:

Chikao Ikenaga, Tokyo, JP;

Takanori Maruoka, Tokyo, JP;

Sachiyo Matsuura, Tokyo, JP;

Assignee:

Dai Nippon Printing Co., Ltd., Tokyo, JP;

Attorney:

BURR PATENT LAW, PLLC

Primary Examiner:

Christopher S Kessler

Int. Cl.
CPC ...
C23C 14/04 (2006.01); C23F 1/28 (2006.01); H05B 33/10 (2006.01); C23F 1/02 (2006.01); C23C 14/24 (2006.01); C23C 14/12 (2006.01); B05C 21/00 (2006.01); C30B 25/04 (2006.01); C23C 16/04 (2006.01); H05K 3/14 (2006.01); B05B 12/20 (2018.01); H10K 50/00 (2023.01); C22C 38/08 (2006.01); B05D 1/32 (2006.01); H10K 71/00 (2023.01); H10K 71/16 (2023.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); B05B 12/20 (2018.02); B05C 21/005 (2013.01); C23C 14/04 (2013.01); C23C 14/12 (2013.01); C23C 14/243 (2013.01); C23C 16/04 (2013.01); C23F 1/02 (2013.01); C23F 1/28 (2013.01); C30B 25/04 (2013.01); H05B 33/10 (2013.01); H05K 3/143 (2013.01); H10K 50/00 (2023.02); B05D 1/32 (2013.01); C22C 38/08 (2013.01); C23C 14/24 (2013.01); H10K 71/00 (2023.02); H10K 71/166 (2023.02);
Abstract

A deposition mask in which deformation of long sides is restrained is manufactured. A manufacturing method of a deposition mask includes a step of preparing a metal plate; a processing step of processing the metal plate into an intermediate product comprising: a plurality of deposition mask portions each including a pair of long sides and a pair of short sides, and having a plurality of through-holes formed therein; and a support portion that surrounds the plurality of deposition mask portions, and is partially connected to the short sides of the plurality of deposition mask portions; and a separation step of separating the deposition mask portions from the support portion to obtain the deposition mask. In the intermediate product, the long sides of the deposition mask portions are not connected to the support portion.

Find Patent Forward Citations

Loading…