The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2023
Filed:
Mar. 31, 2016
Applicant:
Bühler Alzenau Gmbh, Alzenau, DE;
Inventors:
Jürgen Pistner, Alzenau-Michelbach, DE;
Harro Hagedorn, Frankfurt a.M., DE;
Assignee:
Bühler Alzenau GmbH, Alzenau, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/00 (2006.01); C23C 14/54 (2006.01); H01J 37/18 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 14/0078 (2013.01); C23C 14/547 (2013.01); H01J 37/18 (2013.01); H01J 37/32036 (2013.01); H01J 37/32119 (2013.01); H01J 37/32155 (2013.01);
Abstract
The invention relates to a method for producing substrates having a plasma coated surface made of a dielectric coating material in a vacuum chamber, having an AC-powered plasma device, comprising moving a substrate relative to the plasma device by means of a movement device along a curve, and depositing coating material on a surface of the substrate in a coating region along a trajectory lying on the surface of the substrate using the plasma device.