The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2023
Filed:
Feb. 20, 2019
Applicant:
Maruzen Petrochemical Co., Ltd., Chuo-ku, JP;
Inventors:
Satoshi Kakuta, Chiba, JP;
Hiromitsu Baba, Ichihara, JP;
Teruyo Ikeda, Ichihara, JP;
Ryo Fujisawa, Narashino, JP;
Kazuhiko Haba, Chiba, JP;
Assignee:
Maruzen Petrochemical Co., Ltd., Chuo-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
C07C 69/602 (2006.01); C08F 22/26 (2006.01); C08F 12/24 (2006.01); G03F 7/027 (2006.01);
U.S. Cl.
CPC ...
C07C 69/602 (2013.01); C08F 12/24 (2013.01); C08F 22/26 (2013.01); G03F 7/027 (2013.01);
Abstract
Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): (wherein Rrepresents a hydrogen atom or a methyl group, Rrepresents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).