The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2023
Filed:
Jan. 29, 2021
Applicant:
Atmospheric Plasma Solutions, Inc., Cary, NC (US);
Inventor:
Peter Joseph Yancey, Cary, NC (US);
Assignee:
AP Solutions Inc., Cary, NC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 4/134 (2016.01); C23C 4/04 (2006.01); B08B 7/00 (2006.01); B44D 3/16 (2006.01); C23G 5/00 (2006.01); H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32009 (2013.01); B08B 7/0035 (2013.01); B44D 3/16 (2013.01); C23G 5/00 (2013.01); H05H 1/2481 (2021.05); H05H 1/2487 (2021.05);
Abstract
In a method is provided for removing a material from a substrate, a plasma is generated at atmospheric pressure. The plasma includes an energetic species reactive with one or more components of the material. The plasma is flowed from an outlet as a plasma plume that includes periodic regions of high plasma density and low plasma density. The material is exposed to the plasma plume. At least one component of the material reacts with the energetic species, and at least one other component of the material is physically impacted and moved by one or more of the regions of high plasma density.