The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 2023

Filed:

Dec. 24, 2019
Applicant:

Daicel Miraizu Ltd., Tokyo, JP;

Inventors:

Kiyoshi Shimizu, Tokyo, JP;

Masahiko Itakura, Tokyo, JP;

Norihisa Wada, Tokyo, JP;

Takayuki Uno, Tokyo, JP;

Assignee:

DAICEL MIRAIZU LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01F 7/02 (2006.01); H01F 1/053 (2006.01); H01F 41/02 (2006.01);
U.S. Cl.
CPC ...
H01F 7/021 (2013.01); H01F 1/0533 (2013.01); H01F 41/026 (2013.01);
Abstract

Provided are a rare earth magnet precursor having a roughened structure on a surface or a rare earth magnet molded body having a roughened structure on a surface, and a method for manufacturing the same. In the rare earth magnet precursor or the rare earth magnet molded body, recesses and protrusions are formed on the surface having the roughened structure, and the recesses and protrusions satisfy at least one of the following (a) to (c): (a) an arithmetic mean height (Sa) (ISO 25178) from 5 to 300 μm, (b) a maximum height (Sz) (ISO 25178) from 50 to 1500 μm, and (c) a developed interfacial area ratio (Sdr) (ISO 25178) from 0.3 to 12.


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