The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 2023

Filed:

May. 12, 2021
Applicant:

Korea Research Institute of Standards and Science, Daejeon, KR;

Inventors:

Chan Yong Hwang, Seoul, KR;

Kyoung Woong Moon, Daejeon, KR;

Seung Mo Yang, Daejeon, KR;

Chang Soo Kim, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01F 10/32 (2006.01); H01F 7/06 (2006.01); G06T 7/00 (2017.01); G06F 18/22 (2023.01);
U.S. Cl.
CPC ...
H01F 10/324 (2013.01); G06F 18/22 (2023.01); G06T 7/001 (2013.01); H01F 7/064 (2013.01); G06T 2207/30108 (2013.01);
Abstract

The present disclosure relates to a device and method for forming skyrmion in a magnetic thin film. A skyrmion forming method comprises aligning the surface of the magnetic thin film and a horizontal magnetic field to be applied to the magnetic thin film and applying the horizontal magnetic field and a vertical magnetic field to the magnetic thin film. Accordingly, it is possible to form the bubble skyrmion easily even in the case of a wide width of a stripe formed on the magnetic thin film.


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Hwang, Chan. (2023). Device and method for forming skyrmion (U.S. Patent No. 11810701). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11810701

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