The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2023
Filed:
Oct. 27, 2020
Applicant:
Himax Technologies Limited, Tainan, TW;
Inventor:
Yu-Ching Cheng, Tainan, TW;
Assignee:
HIMAX TECHNOLOGIES LIMITED, Tainan, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 3/00 (2006.01); G02B 1/11 (2015.01); G02B 3/04 (2006.01); G01S 7/481 (2006.01);
U.S. Cl.
CPC ...
G02B 3/0081 (2013.01); G02B 1/11 (2013.01); G02B 3/0056 (2013.01); G02B 3/04 (2013.01); G01S 7/481 (2013.01);
Abstract
A microlens array device includes a substrate and a microlens array. The microlens array is disposed on the substrate and includes a plurality of first lenses and a plurality of second lenses. Each of the first lenses is used to project a first pattern on a far field. Each of the second lenses is used to project a second pattern on the far field. The first pattern has a first area on the far field. The second pattern has a second area on the far field. The first area is different from the second area. One of the two patterns is completely overlapped on the other one of the two patterns.