The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2023
Filed:
Aug. 30, 2018
Applicant:
Lawrence Livermore National Security, Llc, Livermore, CA (US);
Inventors:
Juergen Biener, San Leandro, CA (US);
Monika M. Biener, San Leandro, CA (US);
Alex V. Hamza, Livermore, CA (US);
Marcus Baeumer, Bremen, DE;
Arne Wittstock, Livermore, CA (US);
Joerg Weissmueller, Karlsruhe, DE;
Dominik Kramer, Karlsruhe, DE;
Raghavan Nadar Viswanath, Eggenstein-Leopoldshafen, DE;
Assignee:
Lawrence Livermore National Security, LLC, Livermore, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01);
U.S. Cl.
CPC ...
C23F 1/00 (2013.01); F05D 2230/25 (2013.01); F05D 2300/133 (2013.01);
Abstract
A method of controlling macroscopic strain of a porous structure includes contacting a porous structure with a modifying agent which chemically adsorbs to a surface of the porous structure and modifies an existing surface stress of the porous structure. Additional methods and systems are also presented.