The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2023
Filed:
Dec. 22, 2021
Applicant:
Industrial Technology Research Institute, Hsinchu, TW;
Inventors:
Kuan-Yeh Huang, Baoshan Township, TW;
Jin-An Wu, Huwei Township, TW;
Fu-Ming Chien, Hsinchu, TW;
Yun-Chen Chang, Taichung, TW;
Fan-Jie Lin, New Taipei, TW;
Assignee:
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE, Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 25/06 (2006.01); C08L 53/02 (2006.01); C08J 3/12 (2006.01); C08K 5/13 (2006.01); C08K 5/098 (2006.01);
U.S. Cl.
CPC ...
C08L 25/06 (2013.01); C08J 3/12 (2013.01); C08K 5/098 (2013.01); C08K 5/13 (2013.01); C08L 53/02 (2013.01); C08L 2203/30 (2013.01); C08L 2205/22 (2013.01); C08L 2207/20 (2013.01);
Abstract
An impact-resistant polystyrene resin includes a continuous phase and a plurality of particles dispersed in the continuous phase. The average particle size of the particles is about 0.1 to 4.0 μm, and the average distance between the particles is about 0.3 to 5.0 μm. The impact-resistant polystyrene resin is made from a polystyrene composition including a polystyrene plastic, a styrene block copolymer, a processing aid, and an antioxidant.