The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 2023

Filed:

Feb. 17, 2020
Applicant:

Hitachi Zosen Corporation, Osaka, JP;

Inventors:

Hiroyuki Shinomiya, Osaka, JP;

Hiroyuki Takano, Osaka, JP;

Koichi Izumiya, Osaka, JP;

Masahiro Yamaki, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 1/04 (2006.01); C07C 1/12 (2006.01);
U.S. Cl.
CPC ...
C07C 1/041 (2013.01); C07C 1/12 (2013.01);
Abstract

A methane production system comprises: a reaction tank that produces methane and water by reacting CO and/or COsupplied to the reaction tank with hydrogen; a cleaning tank that is located at an upstream side of the reaction tank in a supply direction of the CO and/or CO, and removes water-soluble impurities from a raw material gas including the CO and/or COand the water-soluble impurities by bringing the raw material gas into contact with water; and a first supply line that supplies the raw material gas from which the water-soluble impurities are removed from the cleaning tank to the reaction tank; and a second supply line supplies water produced in the reaction tank from the reaction tank to the cleaning tank to bring the produced water into contact with the raw material gas in the cleaning tank.


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