The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 2023

Filed:

Jan. 06, 2021
Applicant:

Depuy Synthes Products, Inc., Raynham, MA (US);

Inventors:

David Cowens, West Chester, PA (US);

Mark Thibeault, Brookline, NH (US);

Assignee:

DEPUY SYNTHES PRODUCTS, INC., Raynham, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 17/17 (2006.01); A61B 17/34 (2006.01);
U.S. Cl.
CPC ...
A61B 17/1717 (2013.01); A61B 17/1728 (2013.01); A61B 17/3468 (2013.01); A61B 17/3472 (2013.01); A61B 2017/347 (2013.01);
Abstract

An aiming arm system comprises an aiming arm and a guide sleeve. The aiming arm has 1) a body and a guide hole that extends through the body along a hole axis, and 2) a retention element supported relative to the body. The aiming arm is configured to be positioned such that the hole axis is aligned with a target location of an anatomical implant. The guide sleeve extends along a linear direction, and is sized to be inserted through the guide hole in the linear direction. Relative rotation between the guide sleeve and the retention element transitions the aiming arm system between an unlocked configuration whereby the guide sleeve is insertable through the guide hole, and a locked configuration whereby the retention element applies a retention force to the guide sleeve that substantially prevents the guide sleeve from moving further along the linear direction.


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