The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2023
Filed:
May. 03, 2022
Avesha, Inc., Bedford, MA (US);
Prabhudev Navali, Westford, MA (US);
Raj Nair, Lexington, MA (US);
Prasad Dorbala, Lexington, MA (US);
Sudhir Halbhavi, Bangalore, IN;
Sai Koti Reddy Danda, Narasaraopeta, IN;
Avesha, Inc., Chelmsford, MA (US);
Abstract
A technique is directed toward controlling placement of workloads of an application within an application environment. The technique involves, while a first placement of workloads of the application is in a first deployment of resources within the application environment, generating a set of resource deployment changes that accommodates a predicted change in demand on the application. The technique further involves adjusting the first deployment of resources within the application environment to form a second deployment of resources within the application environment, the second deployment of resources being different from the first deployment of resources. The technique further involves providing a second placement of workloads of the application in the second deployment of resources to accommodate the predicted change in demand on the application, the second placement of workloads being different from the first placement of workloads.