The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 31, 2023

Filed:

Sep. 12, 2019
Applicant:

Saft America, Cockeysville, MD (US);

Inventors:

Xilin Chen, Timonium, MD (US);

Saori Tokuoka, Towson, MD (US);

Frank Cao, North Potomac, MD (US);

Jian Dong, Timonium, MD (US);

Carine Margez, Baltimore, MD (US);

Owen Ou, Gaithersburg, MD (US);

Thomas Greszler, Phoenix, AZ (US);

Assignee:

SAFT AMERICA, Cockeysville, MD (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/58 (2010.01); H01M 4/525 (2010.01); H01M 10/0525 (2010.01); H01M 10/0563 (2010.01); H01M 10/0568 (2010.01); H01M 4/02 (2006.01);
U.S. Cl.
CPC ...
H01M 4/5825 (2013.01); H01M 4/525 (2013.01); H01M 10/0525 (2013.01); H01M 10/0563 (2013.01); H01M 10/0568 (2013.01); H01M 2004/028 (2013.01); H01M 2300/002 (2013.01);
Abstract

Provided is a positive electrode active material for a lithium-ion battery, the positive electrode active material including a blend of a doped lithium manganese iron phosphate (dLMFP) according to the formula: LiMnFeMPO, wherein 0.9<x+y<1; and M is one or more selected from the group consisting of Mg, Ca and Ba with one or both of a lithium nickel cobalt manganese oxide (NMC) compound having a Ni content greater than 0.6 relative to a total amount of metals other than Li and a lithium nickel cobalt aluminum oxide (NCA) compound. In particular, provided is a blend at a weight ratio of dLMFP to NMC and/or NCA (i.e., dLMFP:(NMC+NCA)) of >70:<30, such as 75:25, 80:20, 85:15, 90:10, etc.


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