The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 31, 2023

Filed:

Jul. 27, 2018
Applicant:

Vettery, Inc.;

Inventors:

Bhavish Agarwal, Rani Bagh, IN;

Abhishek Gupta, San Francisco, CA (US);

Ye Xu, Foster City, CA (US);

Assignee:

Vettery, Inc., New York, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06Q 10/1053 (2023.01); G06N 20/00 (2019.01); G06F 16/335 (2019.01); G06F 18/21 (2023.01);
U.S. Cl.
CPC ...
G06Q 10/1053 (2013.01); G06F 16/335 (2019.01); G06F 18/21 (2023.01); G06N 20/00 (2019.01);
Abstract

The presently disclosed subject matter includes an apparatus with a processor and a memory storing code which, when executed by the processor, causes the processor to receive a data profile associated with a candidate resource, the data profile includes a set of attributes of the candidate resource which are relevant for assessing the candidate resource's suitability to satisfy a particular resource demand. The apparatus extracts an n-dimensional feature vector from the received data profile, the n-dimensional feature vector capturing aspects of the candidate resource's attributes and process said n-dimensional feature vector with a first ensemble machine learning model to generate a first suitability factor. Likewise, the apparatus process said n-dimensional feature vector with a second ensemble machine learning model to generate a second suitability factor. The apparatus determines whether to allocate the candidate resource to the particular resource demand using said first and second suitability factors.


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