The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 31, 2023

Filed:

Nov. 08, 2021
Applicant:

Coretronic Corporation, Hsin-Chu, TW;

Inventor:

Chang-Hsuan Chen, Hsin-Chu, TW;

Assignee:

Coretronic Corporation, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/12 (2006.01); G03B 21/20 (2006.01); G02B 27/10 (2006.01); G02B 27/18 (2006.01);
U.S. Cl.
CPC ...
G02B 27/12 (2013.01); G02B 27/1006 (2013.01); G02B 27/18 (2013.01); G03B 21/204 (2013.01); G03B 21/2066 (2013.01);
Abstract

A beam-splitting element and a projection device provide an image with good uniformity. The beam-splitting element has first and second regions, and the beam-splitting element includes first and second pattern films. The first pattern film is located on the second region and allows a light beam with an emission wavelength within a first waveband range to penetrate. The second pattern film is located on the second region and reflects the light beam with the emission wavelength within the first waveband range. The first and second pattern films are not overlapped with each other, and the first and second pattern films form a beam-splitting pattern together on the second region. A ratio of an area of the first pattern film occupied in the second region is between 30% and 70%. The beam-splitting element of the invention provides an image projected from the projection device with good uniformity.


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