The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2023
Filed:
Feb. 01, 2022
Applicant:
Tosoh Corporation, Shunan, JP;
Inventors:
Masami Mesuda, Ayase, JP;
Hideto Kuramochi, Ayase, JP;
Assignee:
TOSOH CORPORATION, Shunan, JP;
Primary Examiner:
Int. Cl.
CPC ...
C01B 21/06 (2006.01); C23C 14/34 (2006.01); C30B 29/38 (2006.01); C04B 35/58 (2006.01); C23C 14/06 (2006.01); C30B 23/02 (2006.01); C30B 25/20 (2006.01); C30B 29/40 (2006.01); C30B 29/68 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C01B 21/0632 (2013.01); C04B 35/58 (2013.01); C23C 14/0641 (2013.01); C23C 14/34 (2013.01); C23C 14/3414 (2013.01); C30B 23/025 (2013.01); C30B 25/20 (2013.01); C30B 29/38 (2013.01); C30B 29/406 (2013.01); C30B 29/68 (2013.01); H01J 37/3426 (2013.01); C01P 2006/10 (2013.01); C01P 2006/40 (2013.01); C01P 2006/80 (2013.01);
Abstract
A sputtering target for a gallium nitride thin film, which has a low oxygen content, a high density and a low resistivity. A gallium nitride powder having powder physical properties of a low oxygen content and a high bulk density is used and hot pressing is conducted at high temperature in high vacuum to prepare a gallium nitride sintered body having a low oxygen content, a high density and a low resistivity.