The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2023
Filed:
Jan. 31, 2019
The Hong Kong Research Institute of Textiles and Apparel Limited, Hong Kong, HK;
Lei Yao, Hong Kong, CN;
Xiao Liao, Hong Kong, CN;
Yongli Wang, Hong Kong, CN;
Siyu Lin, Hong Kong, CN;
The Hong Kong Research Institute of Textiles and Apparel Limited, Hong Kong, CN;
Abstract
The present disclosure provides a method for reducing the inhalation of microorganisms, a washable mask for reducing the inhalation of microorganisms, applications of the mask and a method for manufacturing the same. The method for reducing the inhalation of microorganisms includes the steps of: providing a mask with a breathing zone, the breathing zone being used for covering a breathing part of a user; arranging two or more magnets around the breathing zone of the mask, the magnets generating a three-dimensional magnetic field, so as to change the moving trajectories of charged microorganisms in gas to be inhaled thereby increasing the probability of the microorganisms being captured by the filtering material.