The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2023
Filed:
Jan. 08, 2020
Parcan Nanotech Co., Ltd., Shanghai, CN;
Ivo Rangelow, Baunatal, DE;
Xiang-Qian Zhou, Nashan District-Shenzhen, CN;
Dimitre Karpuzov, Woodstock, CA;
PARCAN NANOTECH CO., LTD., Shanghai, CN;
Abstract
The present invention is related to a substrate () for a controlled implantation of ions () into a bulk (), the substrate () comprising the bulk () composed of a crystalline first material (), the bulk () comprising an implantation region () and a surface (), wherein the implantation region () is located within the bulk () and along an implantation direction () at an implantation depth () below an implantation area () on the surface () of the bulk (). Further, the present invention is related to a method of preparing a substrate () for a controlled implantation of ions () into a bulk (), preferably the aforementioned substrate (), the substrate () comprising the bulk () composed of a crystalline first material (), the bulk () comprising an implantation region () and the surface (), wherein the implantation region () is located within the bulk () and along an implantation direction () at an implantation depth () below an implantation area () on the surface () of the bulk ().