The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2023

Filed:

Apr. 27, 2019
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Joseph Yudovsky, Campbell, CA (US);

Alexander S. Polyak, Palm Coast, FL (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/68 (2006.01); H01L 21/687 (2006.01); C23C 16/458 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6719 (2013.01); C23C 16/4584 (2013.01); C23C 16/45544 (2013.01); H01L 21/67196 (2013.01); H01L 21/68 (2013.01); H01L 21/68764 (2013.01); H01L 21/68792 (2013.01); H01L 2221/68309 (2013.01);
Abstract

Apparatus and methods of processing a substrate in a carousel processing chamber are described. A wafer pedestal has a support surface with a support shaft extending below the wafer pedestal. A roller pinion wheel is below the wafer support around the support shaft. The roller pinion wheel has a plurality of spokes in contact with the support shaft and a wheel with a plurality of roller pinions spaced around the outer periphery of the wheel. Processing chambers incorporating the wafer pedestal and processing methods using the wafer pedestal for in-situ rotation are also described.


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