The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2023
Filed:
Jun. 02, 2021
Tsinghua University, Beijing, CN;
Hon Hai Precision Industry Co., Ltd., New Taipei, TW;
Wei-Chen Wu, Beijing, CN;
Jun Zhu, Beijing, CN;
Guo-Fan Jin, Beijing, CN;
Shou-Shan Fan, Beijing, CN;
Tsinghua University, Beijing, CN;
HON HAI PRECISION INDUSTRY CO., LTD., New Taipei, TW;
Abstract
The present application relates to an off-axis two-mirror infrared imaging system including a primary reflecting mirror and a secondary reflecting mirror. The primary reflecting mirror is located on the incident light path of an incident infrared light beam and reflects the incident infrared light beam to form a first reflected light beam. The secondary reflecting mirror is located on the reflection light path of the primary reflecting mirror, and is used to reflect the first reflected light beam to form a second reflected light beam. The second reflected light beam reaches an image surface after passing through the incident infrared light beam. The reflective surfaces of the primary reflecting mirror and the secondary reflecting mirror are freeform surfaces. The secondary reflecting mirror and the image plane are respectively located on both sides of the incident infrared light beam.