The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2023
Filed:
Aug. 31, 2019
Dalian University of Technology, Liaoning, CN;
Yongchen Song, Liaoning, CN;
Jiafei Zhao, Liaoning, CN;
Man Li, Liaoning, CN;
Lei Yang, Liaoning, CN;
Weiguo Liu, Liaoning, CN;
Mingjun Yang, Liaoning, CN;
Yanghui Li, Liaoning, CN;
Zheng Ling, Liaoning, CN;
Yu Liu, Liaoning, CN;
Yi Zhang, Liaoning, CN;
Dayong Wang, Liaoning, CN;
DALIAN UNIVERSITY OF TECHNOLOGY, Liaoning, CN;
Abstract
The invention discloses a gas hydrate pressure maintaining replacement device and method for in-situ Raman analysis. Comprehensive experiments such as the formation/decomposition/displacement of high-pressure gas hydrates can be realized, and in-situ Raman characterization can be performed. Including reaction kettle system with temperature control unit, pressure control gas supply system, pressure holding system, replacement gas system, sample pre-cooling system, vacuum system and data acquisition and processing system. The device can solve the problem that the Raman peak position of the 512 cage is covered by the Raman peak position of the gas when the high-pressure gas hydrate is characterized in situ in the reaction kettle, at the same time, it solves the problems of sampling difficulties in ex-situ Raman characterization and experimental errors caused by sample transfer.