The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2023

Filed:

Jan. 24, 2020
Applicants:

Kabushiki Kaisha Toshiba, Minato-ku, JP;

Kioxia Corporation, Minato-ku, JP;

Inventors:

Kenya Uchida, Yokohama, JP;

Hiroyuki Fukui, Yokkaichi, JP;

Ikuo Uematsu, Yokohama, JP;

Assignees:

KABUSHIKI KAISHA TOSHIBA, Minato-ku, JP;

Kioxia Corporation, Minato-ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); B01D 53/68 (2006.01); B01D 53/79 (2006.01); C30B 25/14 (2006.01); C30B 29/06 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4412 (2013.01); B01D 53/68 (2013.01); B01D 53/79 (2013.01); C30B 25/14 (2013.01); C30B 29/06 (2013.01); B01D 2257/204 (2013.01); B01D 2257/553 (2013.01);
Abstract

According to one embodiment, a silicon-containing product forming apparatus includes a reaction chamber, an emission path, a process liquid tank, a supplier, and a flow path switcher. The emission path emits an emission material from the reaction chamber. The supplier includes a supply line configured to supply a process liquid to the emission path from the process liquid tank, and a byproduct generated by reaction is treated in the emission path by the supplied process liquid. The flow path switcher switches the communication state of the emission path with each of the reaction chamber and the supply line of the supplier.


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