The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2023
Filed:
Jan. 29, 2021
Fujifilm Business Innovation Corp., Tokyo, JP;
Satomi Kashiwagi, Kanagawa, JP;
Satoshi Inoue, Kanagawa, JP;
Sumiaki Yamasaki, Kanagawa, JP;
Yoshifumi Iida, Kanagawa, JP;
Takako Kobayashi, Kanagawa, JP;
Takashi Hasegawa, Kanagawa, JP;
FUJIFILM Business Innovation Corp., Tokyo, JP;
Abstract
Pressure-responsive particles include pressure-responsive base particles and inorganic oxide particles, in which the pressure-responsive base particles contain a styrene-based resin which contains styrene and other vinyl monomers as polymerization components and a (meth)acrylic acid ester-based resin which contains at least two kinds of (meth)acrylic acid esters as polymerization components and in which amass ratio of the (meth)acrylic acid esters to all polymerization components is 90% by mass or higher, a liberation rate of the inorganic oxide particles is 10% by mass or higher and 40% by mass or lower, the pressure-responsive particles have at least two glass transition temperatures, and a difference between a lowest glass transition temperature and a highest glass transition temperature is 30° C. or higher.